CHEMICAL VAPOR DEPOSITION APPARATUS

摘要

PURPOSE: A chemical vapor deposition apparatus is provided to secure uniformity of a reaction gas by separately spraying the reaction gas. CONSTITUTION: A reaction chamber(100) includes a reaction space. A wafer boat(200) is arranged in the reaction space. The wafer boat includes a plurality of wafers. A gas supply unit(300) is formed around the wafer boat and sprays a reaction gas to each wafer.