| 摘要 |
<p>A fluid handling structure (12) for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space (11) configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings (50) arranged in a first line that, in use, are directed towards a substrate (W) and/or a substrate table (WT) configured to support the substrate; a gas knife device (60) having an elongate aperture (61) in a second line; and an elongate opening or a plurality of openings (302) adjacent the gas knife device.</p> |
