发明名称 Resistive memory device and method of manufacturing the same
摘要 Provided is a resistive memory device and a method of manufacturing the resistive memory device that includes a bottom electrode, an insulating layer that is formed on the bottom electrode and has a hole that exposes the bottom electrode, a resistance layer and an intermediate layer which are formed in the hole, a switch structure formed on a surface of the intermediate layer, and an upper electrode formed on the switch structure.
申请公布号 US8426837(B2) 申请公布日期 2013.04.23
申请号 US20080073666 申请日期 2008.03.07
申请人 LEE MYOUNG-JAE;PARK YOUNG-SOO;LEE JUNG-HYUN;HWANG SOON-WON;CHUNG SEOK-JAE;LEE CHANG-SOO;SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE MYOUNG-JAE;PARK YOUNG-SOO;LEE JUNG-HYUN;HWANG SOON-WON;CHUNG SEOK-JAE;LEE CHANG-SOO
分类号 H01L29/02;H01L29/06;H01L47/00 主分类号 H01L29/02
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