COMPOUND, RESIN AND PHOTORESIST COMPOSITION

摘要

PURPOSE: A photoresist composition is provided to provide a fine photoresist pattern with excellent exposure latitude. CONSTITUTION: A resin includes a structure unit represented by chemical formula aa. In the chemical formula aa: T^1 is a substituted or non-substituted C3-34 sultone cyclic group; X^1 is -O- or -N(R^c)-; R^c is hydrogen or a C1-6 alkyl group; Z^1 is X^2 or -X^3-X^4-CO-X^5- where each of X^2, X^3, and X^5 is a C1-6 alkanediyl group, and X^4 is -O- or -N(R^d)-; R^d is hydrogen or a C1-6 alkyl group; and R^1 is hydrogen, halogen, or a C1-6 alkyl group capable of including halogen. A photoresist composition includes the resin.