发明名称 STRUCTURE AND METHOD FOR INTEGRATING FRONT END SiCr RESISTORS IN HiK METAL GATE TECHNOLOGIES
摘要 An integrated circuit having a replacement HiK metal gate transistor and a front end SiCr resistor. The SiCr resistor replaces the conventional polysilicon resistor in front end processing and is integrated into the contact module. The first level of metal interconnect is located above the SiCr resistor. First contacts connect to source/drain regions. Second contacts electrically connect the first level of interconnect to either the SiCr resistor or the metal replacement gate.
申请公布号 US2013093024(A1) 申请公布日期 2013.04.18
申请号 US201213654015 申请日期 2012.10.17
申请人 TEXAS INSTRUMENTS INCORPORATED;TEXAS INSTRUMENTS INCORPORATED 发明人 ESHUN EBENEZER
分类号 H01L21/02;H01L27/06 主分类号 H01L21/02
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