发明名称 COALESCED NANOWIRE STRUCTURES WITH INTERSTITIAL VOIDS AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>A semiconductor device, such as an LED, includes a plurality of first conductivity type semiconductor nanowire cores located over a support, a continuous second conductivity type semiconductor layer extending over and around the cores, a plurality of interstitial voids located in the second conductivity type semiconductor layer and extending between the cores, and first electrode layer that contacts the second conductivity type semiconductor layer.</p>
申请公布号 WO2013049042(A2) 申请公布日期 2013.04.04
申请号 WO2012US57081 申请日期 2012.09.25
申请人 GLO AB 发明人 SVENSSON, PATRIK;ROMANO, LINDA;YI, SUNGSOO;KRYLIOUK, OLGA;CHANG, YING-LAN
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