| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stable and long-life etchant composition which is superior in practicability and which enables the etching of a metal multilayer film pattern including a copper layer, a copper oxide layer and/or a copper alloy layer with good accuracy, and allows the formation of good sectional shape, and to provide an etching method with the etchant composition. <P>SOLUTION: The etchant composition is used for etching a metal multilayer film having a copper layer, a copper oxide layer and/or a copper alloy layer. The etchant composition comprises: 0.1-80 wt.% of persulfate and/or persulfuric acid solution; 0.1-80 wt.% of phosphoric acid; and 0.1-50 wt.% of nitric acid and/or sulfuric acid. Adding chloride ions or ammonium ions to the etchant composition, it becomes possible to easily control the etching rate and the sectional shape. Also, the invention relates to an etching method using the etchant composition. <P>COPYRIGHT: (C)2013,JPO&INPIT |
