| 摘要 |
The invention relates to a device for feeding the vapor of a liquid or solid precursor into a coating chamber for depositing a coating, comprising a closed precursor cartridge, which is located completely or partially in a housing that has a connection to a coating chamber. In order to feed the vapor into the coating chamber, the cartridge is opened in such a way that the cartridge cannot be reclosed, such that vapor can enter the housing and can be conducted to the coating chamber. |
