发明名称 |
SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD, LIGHT EXPOSURE METHOD, LIGHT EXPOSURE DEVICE, METHOD FOR MANUFACTURING DEVICE, AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY |
摘要 |
<p>A light exposure device for light exposure treatment of a substrate (P) is provided with: a fine stage that has a substrate holder (PH) for holding part of the substrate (P) in a state assuring flatness and moves relative to a light exposure position (light exposure region (IA)) in the direction of the X-axis; and a substrate Y step feed device (88) that drives the substrate (P) in the direction of the Y-axis in an XY plane. In this instance, X-axis direction movement relative to the light exposure region (IA) by the fine stage holding part of the substrate (P) with the substrate holder (PH) in a state that assures flatness is carried out before and after movement of the substrate (P) in the Y-axis direction by the substrate Y step feed device (88), whereby a plurality of regions on the substrate (P) are light exposure treated.</p> |
申请公布号 |
WO2013031223(A1) |
申请公布日期 |
2013.03.07 |
申请号 |
WO2012JP05466 |
申请日期 |
2012.08.30 |
申请人 |
NIKON CORPORATION;AOKI, YASUO |
发明人 |
AOKI, YASUO |
分类号 |
G03F7/20;H01L21/027;H01L21/68 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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