| 摘要 |
<p>PURPOSE: An active ray-sensitive or radiation-sensitive resin composition is provided to obtain high-sensitivity, roughness performance, and sufficient sealing performance. CONSTITUTION: An active ray-sensitive or radiation-sensitive resin composition contains a resin and a compound indicated in chemical formula 1. The resin comprises a repeating unit, which contains an acid-generating group be being decomposed by active ray or radiation irradiation. In chemical formula 1, each of l, m, o, p, and q is an integer from 1 or more; n is an integer from 2 or more; r and s is an integer from 1 or more; t is an integer from 0 or more; each of -Y1- and -Y2- is independently -O-, -S-, or -CO-; each of R1 and R2 is independently a hydrogen atom, alkyl group, aryl group, or aralkyl group; if n>=3 and t>=1, R3 is a hydrogen atom, alkyl group, aryl group, or aralkyl group; if n>=3 and t=0, R3 is a alkyl group, aryl group, or aralkyl group; and if n=2, R3 is an aryl group or aralkyl group.</p> |
