| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique enabling deposition with a uniform diffusion on a surface of a large deposition target using an apparatus having a simple configuration. <P>SOLUTION: The vapor deposition apparatus includes a vacuum tank in which the deposition target is placed, an evaporation source provided outside the vacuum tank and for generating vapor of evaporation material, and a planar vapor emitter planarly emitting the vapor of the evaporation material onto the deposition target. The planar vapor emitter has a plurality of elongated vapor emitters 3 arranged in the vacuum tank 2 at a predetermined interval, and the plurality of vapor emitters 3 have first to fifth cylindrical vapor diffusion chambers 11-15 coaxially arranged with different diameters, and each of the first to fifth vapor diffusion chambers 11-15 is connected to an adjacent vapor diffusion chamber via first to fourth connecting holes 21-24 through which the vapor of the evaporation material ca pass. <P>COPYRIGHT: (C)2013,JPO&INPIT |
