APPARATUS FOR TREATING SUBSTRATE

摘要

PURPOSE: An apparatus for treating a substrate is provided to uniformly treat substrates in each chamber by uniformly exhausting gas from multiple chambers. CONSTITUTION: Multiple chambers are stacked. An exhaust unit(200) is connected to each chamber to exhaust gas remaining in the chambers. The exhaust unit includes a body and an exhaust pipe. The body(210) is positioned at one side of the chambers and includes an exhaust space connected to the chambers. An exhaust pipe(230) is positioned in the exhaust space and connected to a pressure reduction member. The exhaust pipe includes an inlet for sucking the gas in the exhaust space.