发明名称 SUBSTRATE PROCESSOR
摘要 <P>PROBLEM TO BE SOLVED: To improve exhaust efficiency and uniformity of exhaust capability in a processing chamber while maintainability of the processing chamber where mist easily occurs is secured. <P>SOLUTION: In an indoor exhaust mechanism 112 of a blow cleaning room R2, a first partition plate 114 is positioned at a position higher than an upper 2 fluid nozzle 104U and lower than exhaust ports 106 and 108, and divides an indoor space of the blow cleaning room R2 into an upper space UR2 and a lower space LR2 in a longitudinal direction. Two slit openings 116 and 118 extending in a chamber width direction (Y direction) in one line are formed between the first partition plate 114 and an upstream partition wall 86. A second partition plate 124 divides the upper space UR2 extending above the first partition plate 114 into a first exhaust space 120 extending between the first opening 116 and the first exhaust port 106 and a second exhaust space 122 extending between the second opening 118 and the second exhaust port 108 in a lateral direction. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013026490(A) 申请公布日期 2013.02.04
申请号 JP20110160689 申请日期 2011.07.22
申请人 TOKYO ELECTRON LTD 发明人 KODAMA MUNEHISA;MIYAZAKI KAZUHITO
分类号 H01L21/304;H01L21/027;H01L21/677 主分类号 H01L21/304
代理机构 代理人
主权项
地址