| 摘要 |
PURPOSE: A chemical supplying pump of a substrate coater device is provided to minimize the generation of bubbles in chemical supplied on a substrate by suppressing the vortex generation of chemical. CONSTITUTION: A chemical supplying pump(200) of a substrate coater device includes a cylinder(210), a plunger(220), and a membrane-shaped sealing member(230). The cylinder includes an inlet(212) and an outlet(214), and a chemical receiving space is arranged in the cylinder. The plunger moves in the cylinder along an axial line. The tip end side of the plunger is engaged with one inner wall of the cylinder. The sealing member seals a gap between the cylinder and the plunger. Fluid sucked trough the inlet is discharged through the outlet by moving the plunger. |
