| 发明名称 |
PHOTOSENSITIVE SILOXANE RESIN COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive siloxane resin composition having excellent alkali solubility and sensitivity, and a pattern formation method using the same. <P>SOLUTION: There is provided a photosensitive siloxane resin composition that contains the following: a siloxane resin having a silanol group or alkoxysilyl group; a crown ether; a photosensitizing agent; and an organic solvent. A pattern is formed by coating the photosensitive composition on a substrate, subjecting the composition to image-wise exposure, treating the same with an aqueous alkaline solution, and then firing. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2012242600(A) |
申请公布日期 |
2012.12.10 |
| 申请号 |
JP20110112455 |
申请日期 |
2011.05.19 |
| 申请人 |
AZ ELECTRONIC MATERIALS IP LTD |
发明人 |
SEKITO TAKASHI;YOKOYAMA HIROSHI;FUKUIE TAKASHI;TASHIRO YUJI;NONAKA TOSHIAKI;TANAKA YASUAKI |
| 分类号 |
G03F7/004;G03F7/023;G03F7/075;H01L21/027 |
主分类号 |
G03F7/004 |
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