| 摘要 |
<p>PURPOSE: An optical proximity correction method for preventing misalignment of overlay data and a cell is provided to improve delta distortion using an overlay vernier of a box-in-box form. CONSTITUTION: An overlay vernier of a box-in-box form is prepared(S10). A first layer and a second layer are exposed under the same DOE(Design of Experiment) conditions. Overlay reference date is obtained(S20). The first layer and the second layer are exposed with different DOE conditions. An infra field overlay value is measured(S30). Optical proximity correction is performed by comparing and analyzing the measured infra field overlay value and the overlay reference date(S40). [Reference numerals] (AA) Start; (BB) End; (S10) Preparation of an overlay vernier of a common box-in-box shape; (S20) Obtaining overlay reference date by exposing a first layer and a second layer under the same DOE; (S30) Measuring an infra field overlay value by exposing the first layer and the second layer under different DOE conditions; (S40) Performing optical proximity correction by comparing and analyzing the measured infra field overlay value and the overlay reference data</p> |
