| 摘要 |
PURPOSE: An apparatus for manufacturing a semiconductor is provided to maintain a cleaning period to be long by absorbing microwaves which are reflected from a processing chamber. CONSTITUTION: A chamber comprises a bottom plane, a sidewall, and a cover(20). An irradiation unit(180) is located inside the chamber. A substrate mounting unit(30) is arranged between the bottom plane and the irradiation unit. An irradiation tube is formed into a disk shape with an opening lower side. A center hole passes through the center of the irradiation tube. |
