发明名称 PROTECTIVE STRUCTURE OF SEMICONDUCTOR WAFER, METHOD FOR PROTECTING SEMICONDUCTOR WAFER AND METHOD FOR PROCESSING SEMICONDUCTOR WAFER
摘要 Disclosed herein is a semiconductor wafer protection structure including a semiconductor wafer and a protective sheet overlaid on a circuit surface of the semiconductor wafer, wherein the protective sheet has a larger diameter than the outer diameter of the semiconductor wafer. <??>The invention provides semiconductor wafer protection structures and methods, and laminated protective sheet for use therein that enable prevention of damage to a wafer during grinding and transportation when the wafer is ground to an ultrathin thickness and transported. Also provided is a process for processing a semiconductor wafer whereby damage to the wafer can be reduced during application and cutting of an adhesive sheet. <IMAGE>
申请公布号 EP1542274(B1) 申请公布日期 2012.10.31
申请号 EP20030791245 申请日期 2003.08.21
申请人 LINTEC CORPORATION 发明人 SENOO, HIDEO;NAGAMOTO, KOICHI;HORIGOME, KATSUHIKO;OHASHI, HITOSHI
分类号 H01L21/68;B24B37/30;C09J7/02;H01L21/304;H01L21/683 主分类号 H01L21/68
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