SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY

摘要

Substrates which are suitable for mirrors used at wavelengths in the EUV wavelength range are substrates (1) comprising a base body (2) in which the base body (2) is made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. It is particularly preferable for the base body (2) to be made of a precipitation-hardened copper or aluminum alloy. In addition, a highly reflective layer (6) is provided on the polishing layer (3) of the substrate (1) of the EUV mirror (5).