| 摘要 |
The invention relates to an arrangement for monitoring or predicting a fit, the arrangement comprising a wearable, non-invasive monitoring device, means for creating a personal baseline pattern and means for analysing changes in the collected data with respect to the personal baseline pattern. It is characteristic of the invention that the arrangement further comprises means for updating the baseline pattern and means for comparing the updated version of the baseline pattern with the history. The invention further comprises a corresponding software product for monitoring or predicting a fit. |
