| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain such dual-tone characteristics that an unexposed part and an excessively exposed part are insoluble with an alkali developing solution and only an exposed part with a medium dose is soluble with a developing solution. <P>SOLUTION: A patterning process is provided comprising applying the following resist material on a substrate, exposing, baking and developing the resist material with alkaline water to obtain a negative pattern. The resist material comprises: a polymeric compound having a repeating unit containing a tertiary ester-type acid-labile group and/or an acetal-type acid-labile group including a cyclic structure, and changing into soluble with an alkali developing solution by acid; an acid generator and/or acid; a photobase generator generating a compound having an amino group; a quencher, which is added if necessary and neutralizes the acid generated with the use of the acid generator for inactivation; and an organic solvent. <P>COPYRIGHT: (C)2012,JPO&INPIT |
