| 摘要 |
Disclosed is a cleaning gas for deposits, which contains CHF2COF. The cleaning gas may contain O2, O3, CO, CO2, F2, NF3, Cl2, Br2, I2, XFn (In this formula, X represents Cl, I or Br. n represents an integer satisfying 1≦̸n≦̸7.), CH4, CH3F, CH2F2, CHF3, N2, He, Ar, Ne, Kr and the like, and can be applied to deposits that include at least one selected from the group consisting of W, Ti, Mo, Re, Ge, P, Si, V, Nb, Ta, Se, Te, Os, Ir, Sb, Au, Ag, As, Cr, Hf, Zr, Ni, Co, their compounds, and the like. This cleaning gas is not only excellent in cleaning performances but also easily available and does not substantially by-produce CF4 that places a burden on the environment. |
