发明名称 METHOD FOR REACTIVE SPUTTERING
摘要 <p>The invention is related to the method of creating protective and functional layers using the PVD method, from a cathode with reduced surface electrical conductivity, by way of application from the working coating source where the principle is that the material is applied to the substrate (6) from the working coating source designed as a rotating working cathode (2) wherein the rotating working cathode (2) is coated during the process from the auxiliary coating source with material with sufficient electrical conductivity where the layer of the coating applied to the surface of the rotating working cathode (2) has greater electrical conductivity than the surface of this rotating working cathode (2) created during the processes without coating of the rotating working cathode using the auxiliary coating source.</p>
申请公布号 EP2478126(A1) 申请公布日期 2012.07.25
申请号 EP20100763585 申请日期 2010.07.27
申请人 SHM, S.R.O. 发明人 JILEK, MOJMIR;HOLUBA , PAVEL;IMA, MICHAL
分类号 C23C14/00;C23C14/08 主分类号 C23C14/00
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