发明名称 UNIT FOR LIQUID PHASE EPITAXIAL GROWTH OF SINGLE CRYSTAL SILICON CARBIDE, AND METHOD FOR LIQUID PHASE EPITAXIAL GROWTH OF SINGLE CRYSTAL SILICON CARBIDE
摘要 <P>PROBLEM TO BE SOLVED: To provide a unit comprising a seed material and a feed material for liquid phase epitaxial growth of single crystal silicon carbide enabling to reduce the cost required for liquid phase epitaxial growth of single crystal silicon carbide. <P>SOLUTION: Each of the feed material 11 and the seed material 12 has a surface layer containing polycrystalline silicon carbide whose crystal polymorph is 3C, and through X-ray diffractometry of the each surface layer, a primary diffraction peak corresponding to at least one of (111) crystal plane, (200) crystal plane, (220) crystal plane and (311) crystal plane is observed. The average crystallite diameter calculated from the at least one primary diffraction peak of the feed material 11 is smaller than that calculated from the at least one primary diffraction peak of the seed material 12. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012136372(A) 申请公布日期 2012.07.19
申请号 JP20100288475 申请日期 2010.12.24
申请人 TOYO TANSO KK 发明人 TORIMI SATOSHI;NOGAMI AKIRA;MATSUMOTO TSUYOSHI
分类号 C30B29/36;C30B19/04;H01L21/368 主分类号 C30B29/36
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