POLYMER, PHOTORESIST COMPOSITION, AND METHOD OF FORMING PHOTOLITHOGRAPHIC PATTERN

摘要

PROBLEM TO BE SOLVED: To provide polymers and photoresist compositions useful in forming photolithographic patterns.

SOLUTION: The polymer has a cyclic acetal backbone on a side chain. The photoresist composition contains the polymer and a photo-acid generator. The polymer is a polymer of (meth)acrylic acid ester that has the cyclic acetal backbone on the side chain. A substrate is coated with photoresist. A method of forming the photolithographic patterns is provided. A substrate, and a coated substrate that contains a layer of photoresist composition on a surface of the substrate are provided.

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