发明名称 A COMPOSITION FOR OXIDE THIN FILM, PREPARATION METHOD OF THE COMPOSITION, METHODS FOR FORMING THE OXIDE THIN FILM USING THE COMPOSITION, AND AN ELECTRICAL DEVICE USING THE COMPOSITION
摘要 PURPOSE: A composition for oxide thin film, a manufacturing method thereof, oxide thin film and electric component using the composition are provided to enable formation of oxide semiconductor thin films through a low-temperature process by including a stabilizer. CONSTITUTION: A composition for oxide thin film comprises a first compound, a second compound and a stabilizer. The first compound supplies zinc. The second compound supplies one or more which is selected from indium, tin, gallium, hafnium, magnesium, aluminum, yttrium, tantalum, titanium, zirconium, barium, lanthanum, manganese, tungsten, molybdenum, cerium, chrome, scandium, silicon, neodymium and strontium. The stabilizer controls the conductivity. The stabilizer is included 2-12 times total mole number of the first compound and the second compound. A manufacturing method of the oxide thin film comprises the following steps: spreading the composition for the oxide thin film on the substrate; and heat treating the substrate at higher than 100 deg. Celsius and 450 deg. Celsius or less.
申请公布号 KR20120077788(A) 申请公布日期 2012.07.10
申请号 KR20100139870 申请日期 2010.12.31
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY 发明人 KIM, HYUN JAE;JEONG, WOONG HEE;BAE, JUNG HYEON;KIM, KYUNG MIN
分类号 C01G15/00;C01G9/00;H01B1/08;H01L29/00 主分类号 C01G15/00
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