| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method in which a nanoimprint mold having pattern pitches of not more than 40 nm can be easily manufactured. <P>SOLUTION: In the method for manufacturing a nanoimprint mold, a pattern of the nanoimprint mold is formed by depositing a metal at a desired position on a Si substrate having a SiO<SB POS="POST">2</SB>layer using focused ion beams, and by heating the substrate to coagulate the deposited metal. <P>COPYRIGHT: (C)2012,JPO&INPIT |
