发明名称 |
Method Of Reducing Laser-Induced Damage In Forming Laser-Processed Contacts |
摘要 |
A method for manufacturing a photovoltaic cell comprises depositing a passivation layer and a dielectric layer, or a dielectric passivation layer, on at least one surface of a silicon semiconductor wafer; depositing a doping layer on a region of at least one of the surfaces of the wafer; depositing an electrical contact layer comprising a metal over at least the dielectric layer or the dielectric passivation layer in the region containing the doping layer; and spatially and/or temporally pulse-shaping a laser beam directed at the surface of the wafer to form localized base and/or emitter contacts with a greatly reduced amount of laser-induced damage. |
申请公布号 |
EP2472601(A2) |
申请公布日期 |
2012.07.04 |
申请号 |
EP20100382273 |
申请日期 |
2010.10.19 |
申请人 |
BP CORPORATION NORTH AMERICA INC. |
发明人 |
CARLSON, DAVID E.;ZOU, LIAN;REN, WENSHENG;MORILLA, CARMEN |
分类号 |
H01L31/18;H01L31/068;H01L31/0747 |
主分类号 |
H01L31/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|