发明名称 REFRACTIVE INDEX DISTRIBUTION MEASURING METHOD, REFRACTIVE INDEX DISTRIBUTION MEASURING APPARATUS AND METHOD OF PRODUCING OPTICAL ELEMENT
摘要 The method measures first transmitted wavefronts and second transmitted wavefronts by respectively causing reference light to enter an object placed in plural placement states in a first medium and a second medium, calculates an aberration sensitivity with respect to changes of the placement state of the object, and calculates an alignment error of the object in each placement state by using the aberration sensitivity and the first and second transmitted wavefronts measured in each placement state. The method further calculates first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium, and calculates a refractive index distribution of the object which a shape component thereof is removed, by using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts.
申请公布号 US2012139136(A1) 申请公布日期 2012.06.07
申请号 US201113305827 申请日期 2011.11.29
申请人 KATO SEIMA;CANON KABUSHIKI KAISHA 发明人 KATO SEIMA
分类号 G01N21/41;B29D11/00 主分类号 G01N21/41
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