发明名称 METHOD OF DETECTING ILLUMINANCE DISTRIBUTION IN EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, AND EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To enable measurement of illuminance distribution on and after an intermediate focal point even in a single body of an extreme ultraviolet light source device without providing means of measuring the illuminance distribution on a light exposure device side. <P>SOLUTION: In an EUV light source device, a porous plate 201, a fluorescent plate 202, a folding mirror 203, and a light-receiving detector 205 are provided between a light collecting mirror 6 and an intermediate focal point f for the purpose of extracting only EUV light collected on the intermediate focal point f. The porous plate 201 has many penetration holes arranged so that only light directed toward the intermediate focal point f passes through. The light-receiving detector 205 receives only light collected on the intermediate focal point f. An interpolation process is performed on the spot-like illuminance distribution detected by the light-receiving detector 205 by an image processing part 10 to recover the illuminance distribution of the light collected on the intermediate focal point f. Thereby, deterioration in the illuminance distribution of the EUV light collected on the focal point f can be recognized. Further, by moving the light collecting mirror 6 so as to obtain the better illuminance distribution of EUV light, the illuminance distribution can be improved. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012104368(A) 申请公布日期 2012.05.31
申请号 JP20100251626 申请日期 2010.11.10
申请人 USHIO INC 发明人 YAMATANI DAIKI
分类号 H05G2/00;H01L21/027 主分类号 H05G2/00
代理机构 代理人
主权项
地址