| 摘要 |
PURPOSE: A substrate processing device is provided to reduce the gaps between a rotation shaft and an attachment member as well as the attachment member and a shaft, thereby preventing eccentricity when the rotation shaft rotates. CONSTITUTION: A chamber(100) comprises a reaction space. A substrate mounting unit(200) mounts a substrate(10) in the chamber. A heating unit(300) heats the reaction space. A rotation shaft unit(400) is connected to the substrate mounting unit. A driving unit(500) applies a rotation force to the rotation shaft unit.
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