发明名称 Magnetic circuit for sputtering apparatus
摘要 To provide a magnetic circuit (1) for a magnetron sputtering apparatus, which produces arc-shaped magnetic field lines (2) of high magnetic field strength over a target (11) surface, and has an improved demagnetization resistance. The magnetic circuit (1) includes: an inner magnet (3); an outer magnet (5) having a magnetization direction opposite to that of the inner magnet, and surrounding the inner magnet; a horizontally magnetized magnet (7) disposed between the inner and outer magnets, and magnetized in a direction perpendicular to those of the inner and outer magnets, and in a direction from the inner magnet to the outer magnet, or from the outer magnet to the inner magnet; and a yoke (9) configured so that a magnetic flux passes through the yoke between the inner (3) and outer (5) magnets, in which a magnetic coercive force of the horizontally magnetized magnet (7) is greater in a region closer to the target (11) side than in a center of the magnet interior.
申请公布号 EP2450937(A2) 申请公布日期 2012.05.09
申请号 EP20110187867 申请日期 2011.11.04
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KBAYASHI, HIDEKI
分类号 H01J37/34;C23C14/35;H01F41/02 主分类号 H01J37/34
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