发明名称 MEASUREMENT METHOD AND MEASUREMENT SYSTEM USING THE SAME
摘要 PURPOSE: A measurement method and a measurement system using the same are provided to improve effectiveness of a process by calculating optimized measurement rate by considering product quality and productivity elements. CONSTITUTION: A processing device(100) processes a lot using various methods according to a plurality of process conditions. The process condition includes options for satisfying regulations according to a semiconductor agreement or a customer request. A measurement device(130) is comprised in order to perform a measurement process with respect to the processed lot. The measurement device measures a particle, a defect, a thickness, or a critical dimension of a wafer. The lot processed by the processing device is established as a measured member.
申请公布号 KR20120042528(A) 申请公布日期 2012.05.03
申请号 KR20100104245 申请日期 2010.10.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, HYUN CHEOL;CHANG, IN KAP;TONG, SEUNG HOON
分类号 H01L21/66 主分类号 H01L21/66
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