EXPOSURE APPARATUS, EXPOSURE METHOD, AND BLIND FOR EXPOSURE APPARATUS

摘要

PURPOSE: An exposure apparatus, an exposure method, and a blind for the same are provided to improve exposure reliability by controlling operation of the light blocking blind. CONSTITUTION: A substrate(S) is transferred in a first direction by passing the vertical lower part of a mask(132). A light source part is vertically arranged on the upper part of the mask. The light source part projects light to the substrate through the mask. A blind(134) is vertically arranged on the lower part of the light source part. The blind blocks light projected from the light source part.