| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novolac phenol resin used for a photoresist resin composition having both excellent heat resistance and good sensitivity; and to provide a photoresist resin composition using the same. <P>SOLUTION: The novolac phenol resin is obtained by reacting phenols, dihydroxybenzene or its derivative, and aldehydes in the presence of an acidic catalyst, wherein the composition of the phenols contains 50 to 90 wt.% of metacresol and 10 to 50 wt.% of paracresol. <P>COPYRIGHT: (C)2012,JPO&INPIT |
