发明名称 MECHANISM AND METHOD FOR ALIGNMENT OF A WORKPIECE TO A MASK
摘要 <p>A workpiece: support having alignment iea.i»es to a¾w the proper alignment of the shadow mask to the workpiece is: provided. The alignment features include tactile sensors, so as to measure the pressure being applied to each alignment feature. Based on these pressure readings, a determination can be made as to. whether the workpiece is properly aligned with the shadow mask In some embodiments corrective actions may be initiated if a determination is made that the workpiece is not properly aligned.</p>
申请公布号 WO2012036911(A1) 申请公布日期 2012.03.22
申请号 WO2011US50140 申请日期 2011.09.01
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;KRAMPERT, JEFFREY, E. 发明人 KRAMPERT, JEFFREY, E.
分类号 H01L21/68 主分类号 H01L21/68
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