发明名称 |
MECHANISM AND METHOD FOR ALIGNMENT OF A WORKPIECE TO A MASK |
摘要 |
<p>A workpiece: support having alignment iea.i»es to a¾w the proper alignment of the shadow mask to the workpiece is: provided. The alignment features include tactile sensors, so as to measure the pressure being applied to each alignment feature. Based on these pressure readings, a determination can be made as to. whether the workpiece is properly aligned with the shadow mask In some embodiments corrective actions may be initiated if a determination is made that the workpiece is not properly aligned.</p> |
申请公布号 |
WO2012036911(A1) |
申请公布日期 |
2012.03.22 |
申请号 |
WO2011US50140 |
申请日期 |
2011.09.01 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;KRAMPERT, JEFFREY, E. |
发明人 |
KRAMPERT, JEFFREY, E. |
分类号 |
H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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