| 摘要 |
PURPOSE: An apparatus and method for cleaning a substrate are provided to uniformly heat the entire surface of a substrate by supplying heat to an edge part of the substrate which is rotated by a heating plate. CONSTITUTION: A rotatable substrate support member(310) supports a substrate. A cleaning liquid supply member(340) supplies cleaning liquid to the substrate. The organic solvent supply member(360) supplies an organic solvent to the substrate. A first fluid supply member(350) supplies a first fluid, which is heated at higher temperature than room temperature, to the substrate. A substrate heating member(380) heats an edge part of the substrate.
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