发明名称 III-NITRIDE SEMICONDUCTOR LASER ELEMENT AND III-NITRIDE SEMICONDUCTOR LASER ELEMENT MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a III-nitride semiconductor laser element having high resistance against catastrophic optical damage (COD). <P>SOLUTION: The III-nitride semiconductor laser element 11 has a laser waveguide extending in a direction of a cross line of an m-n plane with a semipolar plane 17a. On both ends of the laser waveguide, first and second end faces 26, 28 serving as laser resonators are provided. The first and second end faces 26, 28 intersect the m-n plane (or a-n plane). A c+ axis vector forms an acute angle with a waveguide vector WV. The waveguide vector WV corresponds to a direction from the second end face 28 to the first end face 26. A thickness of a first dielectric multilayer film 43a on the first end face (C+ side) 26 is thinner than a thickness of a second dielectric multilayer film 43b on the second end face (C- side) 28. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012015564(A) 申请公布日期 2012.01.19
申请号 JP20110230913 申请日期 2011.10.20
申请人 SUMITOMO ELECTRIC IND LTD 发明人 YOSHIZUMI YUSUKE;SHIOYA YOHEI;KYONO TAKASHI;ADACHI MASAHIRO;TOKUYAMA SHINJI;SUMITOMO TAKAMICHI;UENO MASANORI;IKEGAMI TAKATOSHI;KATAYAMA KOJI;NAKAMURA TAKAO
分类号 H01S5/10 主分类号 H01S5/10
代理机构 代理人
主权项
地址