发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for forming a protection film of a touch panel, which can be subjected to alkaline development, and has high transparency as the protection film and excellent adhesion to a substrate and a transparent conductive film and the like. <P>SOLUTION: A alkali-developable photosensitive resin composition (Q) for forming a protection film of a touch panel comprises a hydrophilic resin (A), a polyfunctional (meth)acrylate monomer (B), a phosphoric ester compound (C) containing a carbon-carbon unsaturated double bond, and a photoradical polymerization initiator (D) as essential components. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011248274(A) 申请公布日期 2011.12.08
申请号 JP20100124038 申请日期 2010.05.31
申请人 SANYO CHEM IND LTD 发明人 YAMASHITA MAYUKO;TOKUNAGA HIRONOBU
分类号 G03F7/027;C08F2/48;G06F3/041 主分类号 G03F7/027
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