| 摘要 |
The present invention is related to a method for performing a physical force-assisted cleaning process on a patterned surface of a substrate (1), comprising :
a) providing a substrate having at least one patterned surface,
b) supplying a cleaning liquid (3) to the patterned surface,
c) applying a physical force to the cleaning liquid in contact with the patterned surface, whereby the physical force leads to bubble formation in the cleaning liquid, characterized in that :
prior to applying the physical force, an additive is supplied to said surface, and said additive is maintained in contact with said surface for a given time, said additive and said time being chosen so that substantially complete wetting of the surface by the cleaning liquid is achieved. |
