发明名称 IMAGE DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide an image display device manufactured by multiple patterning which can prevent infiltration of moisture, oxygen, etc. into a thin-film transistor (TFT) layer from a cut surface, and to provide a manufacturing method of the image display device. <P>SOLUTION: An image display device includes: a first substrate made of a bendable transparent substrate; a resin film layer bonded on the first substrate and having a thin film transistor formed on an upper layer; a barrier layer made of an inorganic film covering the surface of the resin film; and a thin film layer formed on the upper layer and a lower layer of the resin film via the barrier layer. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011227369(A) 申请公布日期 2011.11.10
申请号 JP20100098645 申请日期 2010.04.22
申请人 HITACHI DISPLAYS LTD;PANASONIC LIQUID CRYSTAL DISPLAY CO LTD 发明人
分类号 G09F9/30;G02F1/1368;G09F9/00;H01L21/336;H01L27/32;H01L29/786;H01L51/50;H05B33/02;H05B33/04;H05B33/10 主分类号 G09F9/30
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