| 摘要 |
The invention relates to a solar cell, specifically relates to a method for processing surfaces of crystal system silicon substrates for solar cells and a manufacturing method of solar cells. The method for processing surfaces of crystal system silicon substrates comprises a first surface processing step in which the crystal system silicon substrate on the crystal system ingot slices is etched byacid aqueous solution and plural first concavo-convex parts are formed on the external surface of the substrate; and a second surface processing step in which dry etching is performed on the surface where reflection-preventing films are to be formed on the external surface of the first concavo-convex parts formed in the first surface processing step and plural second concavo-convex parts with a smaller size than the first concavo-convex parts are formed. |
