| 摘要 |
The present invention discloses a method of making a photoresist stripper for removing a positive or negative tone photoresist, bonding adhesive, ink mark, and/or post etch residue from a semiconductor substrate, comprising a) an organic sulfonic acid, (b) a halogen-free organic solvent, and (c) an alkanolamine and (d) amine sulfonate or amine sulfonamide or mixtures thereof from semiconductor substrates.
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