| 摘要 |
An optical retroreflective apparatus and method thereof are described. The optical retroreflective apparatus includes a substrate, a first material layer, a first taper pattern layer, a reflecting layer, and a second material layer. The first material layer is formed on the substrate. The first taper pattern layer is formed on the first material layer wherein the first taper pattern layer has a plurality of first pyramidal units. The reflecting layer is formed on the first taper pattern layer wherein the reflecting layer has a plurality of reflecting patterns and each of the reflecting patterns is covered with each of first pyramidal units. The second material layer is formed on the reflecting layer wherein the second material layer has a second taper pattern layer having a plurality of second pyramidal units. The second taper pattern layer is covered with the reflecting layer and the second pyramidal units are filled with the spacing region between the reflecting patterns of the reflecting layer.
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