| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress both a decrease in throughput when failure of an exposure and development system, and a decrease in investment efficiency. <P>SOLUTION: The exposure and development system has a plurality of coating devices that each apply a photosensitive material on a substrate to form a film, exposure devices that each expose the film formed on the substrate, and development devices that each develop the exposed film. The exposure devices are devices for generating a pattern of the light radiated on the film by numerical control based on drawing data prepared beforehand. According to the operational status of the coating devices, exposure devices and development devices, the exposure and development system controls the combination of the coating devices and the exposure devices when conveying the substrate from the coating devices to the exposure devices, and the combination of the exposure devices and the development devices when conveying the substrate from the exposure devices to the development devices. <P>COPYRIGHT: (C)2011,JPO&INPIT |
