发明名称 |
Method for fabricating micro-lens and micro-lens integrated optoelectronic devices using selective etch of compound semiconductor |
摘要 |
Provided are a method of fabricating a microlens using selective etching of a compound semi-conductor and a method of fabricating a photoelectric device having the microlens. The formation of the microlens includes patterning a compound semiconductor layer and removing a lateral surface of the compound semiconductor layer to form a roughly hemispheric lens. The lateral surface of the compound semiconductor layer is removed by a digital alloy method. In particular, the lateral surface of the compound semiconductor layer is removed by a wet etching process.
|
申请公布号 |
US8021903(B2) |
申请公布日期 |
2011.09.20 |
申请号 |
US20060085585 |
申请日期 |
2006.11.28 |
申请人 |
YTEL PHOTONICS INC.;EDITH COWAN UNIVERSITY |
发明人 |
CHANG KI-SOO;LEE YONG-TAK;KAMAL ALAMEH |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|