发明名称 GATE VALVE AND SUBSTRATE TREATMENT DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a gate valve and the like which are capable of enhancing a sealing effect between a wall surface surrounding a substrate carry-in/out port and a valve element by controlling a clearance between the wall surface and the valve element to be finely. SOLUTION: A gate valve 200 is configured to open/close a substrate carry-in/out port 112 by driving back and forth a valve element 210 by means of a cam mechanism 260. The cam mechanism comprises an elongated member 261 slidable in a direction perpendicular to the running back and forth direction of the valve member, a plate-like cam 270 which is provided between the elongated member and the valve element in conjunction with the operation of the elongated member to convert the sliding operation of the elongated member to the back and forth operation of the valve element, a valve element driving member 280 which abuts the valve element in conjunction with the plate-like cam and slides in the back and forth direction to drive the valve element back and forth, and a clearance control member which is provided on the leading end surface of the valve element driving member abutting the valve element to control the clearance between the valve element and the substrate carry-in/out port. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011157989(A) 申请公布日期 2011.08.18
申请号 JP20100018049 申请日期 2010.01.29
申请人 TOKYO ELECTRON LTD 发明人 ENDO KENICHI
分类号 F16K3/18;F16K51/02;H01L21/677 主分类号 F16K3/18
代理机构 代理人
主权项
地址