Controlled electrochemical polishing method,申请号US20050150944-传众专利搜索

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发明名称	Controlled electrochemical polishing method
摘要	The invention relates to a method of polishing a substrate comprising at least one metal layer by applying an electrochemical potential between the substrate and at least one electrode in contact with a polishing composition comprising a reducing agent or an oxidizing agent.
申请公布号	US7998335(B2)	申请公布日期	2011.08.16
申请号	US20050150944	申请日期	2005.06.13
申请人	CABOT MICROELECTRONICS CORPORATION	发明人	FEENEY PAUL M.;BRUSIC VLASTA
分类号	C25F3/18	主分类号	C25F3/18
代理机构		代理人
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地址

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