| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a remote type plasma treatment device and a plasma treatment method capable of efficiently supplying radicals alone after fully controlling charged particles reaching a treated material. <P>SOLUTION: A pressure in a discharge part is retained close to an atmospheric pressure, a pressure in a treatment chamber is retained to be lower than the pressure of the discharge part, a first electrode of a pair of electrodes is overlapped on a partition plate, air-tight connected thereto, and provided with pores respectively connected to a plurality of through holes, a second electrode of the pair of electrodes is arranged to face the first electrode with a predetermined gap therebetween, and a surface of the first electrode on the gap side and the surface of the second electrode on the gap side as well as an inner face of the pore are covered by a dielectric. <P>COPYRIGHT: (C)2011,JPO&INPIT |
