发明名称 Process for producing semiconductive porcelain composition/electrode assembly
摘要 A semiconductive porcelain composition/electrode assembly which is low in room temperature resistivity of 100 &OHgr;·cm or less and is reduced in change with the passage of time due to energization with regard to the semiconductive porcelain composition in which a part of Ba of BaTiO3 is substituted with Bi—Na and which has a P-type semiconductive component at a crystal grain boundary. Also, there is a process for producing a semiconductive porcelain composition/electrode assembly wherein an electrode is joined to a semiconductive porcelain composition in which a part of Ba of BaTiO3 is substituted with Bi—Na and which has a P-type semiconductive component at a crystal grain boundary, the process including joining the electrode to the semiconductive porcelain composition, followed by conducting a heat treatment at a temperature of from 100° C. to 600° C. for 0.5 hour to 24 hours.
申请公布号 US7993965(B2) 申请公布日期 2011.08.09
申请号 US20090920377 申请日期 2009.03.12
申请人 HITACHI METALS, LTD. 发明人 INO KENTARO;SHIMADA TAKESHI
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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